Abstract:
Thin films of zirconium carbides and nitrides have been elaborated by depositing the
zirconium films by RF magnetron sputtering on high carbon steel EN C100 (1 %wt. of carbon)
and nitrided EN C100 steel substrates, followed by a thermal annealing of the
(coatings/substrates) systems. By activing the interstitials atoms (carbone, nitrogen) diffusing
from the substrate to the film, the thermal annealing leads to the formation of hard coatings with
good adhesion to the substrate and excellent mechanical properties. The influence of annealing
temperature on the microstructural and mechanical properties and on the formed compounds in
the thin films is elucidated.
The nitridation of substrates using a thermochemical technique by ionic plasma allows
the formation of stœchiometric compound ZrN of the nitride, while only the under-stœchiometric
compound ZrC0.6 of the carbide which is formed on the pristine substrate. The measured values
of hardness and Young modulus are 28 GPa and 380 GPa for the nitride film against 18 GPa and
240 GPa respectively for the carbide film.
