Abstract:
Vanadium dioxide thin films have been deposited on Corning glass substrates
by a KrF laser ablation of V2O5 target at the laser fluence of 1.5 Jcm-2. The substrate
temperature and the target-substrate distance were set to 500°C and 4cm respectively. Xray
diffraction analysis showed that pure VO2 is only obtained at an oxygen pressure
range of 10-3 – 5 × 10-2 mbar. The structural films properties were correlated to the plume
dynamics studied by fast imaging
