Résumé:
The electrodeposition of cuprous oxide (Cu2O) and copper (Cu) thin films at 29 °C on the ITO/glass substrates from cupric acetate aqueous solution is reported. The electrodeposition mechanism was investigated by cyclic voltammetry. The effect of pH on the electrodeposition of cuprous oxide and copper thin films was studied. The X-ray diffraction (XRD) analysis shows that Cu2O films has a cubic structure and the preferred growth orientation is the (111) direction. The photocurrent characterization indicated that the films deposited at pH = 6.2 has n-type electrical conductivity.
