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Caracterisation des interfaces Si/O2 , Si/Si3N4 et Si/SiOxNy par spectroscopie des photoelectrons (XPS)

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dc.contributor.author Benkherourou Ouahab
dc.contributor.author Deville J.P.
dc.date.accessioned 2022-05-30T09:37:36Z
dc.date.available 2022-05-30T09:37:36Z
dc.date.issued 2017-01-01
dc.identifier.uri http://depot.umc.edu.dz/handle/123456789/11902
dc.language.iso fre
dc.subject Physique
dc.title Caracterisation des interfaces Si/O2 , Si/Si3N4 et Si/SiOxNy par spectroscopie des photoelectrons (XPS)
dc.coverage 02 Disponibles au magazin de la bibliothèque centrale


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